Shobhit Goel

Shobhit Goel, Ph.D., serves as a Global Front End Central Process Integration Engineer at Micron Technology since February 2022, specializing in process optimization and yield improvement in DRAM manufacturing. Prior to this role, Shobhit was a Specially Hired Researcher at The University of Tokyo under the CREST program, focusing on Fe-doped III-V ferromagnetic semiconductors for future memory applications, achieving significant milestones in spin current injection and detection. Shobhit holds a Ph.D. in Electrical Engineering from The University of Tokyo, a Master of Technology in Advanced Material Physics and Engineering from the Academy of Scientific and Innovative Research, and a Bachelor of Technology in Electronics and Communications Engineering from the Indian Institute of Information Technology, Design and Manufacturing, Jabalpur. Additional experience includes a visiting researcher position at Paul Scherrer Institut and various research fellowships at the National Physical Laboratory and the Indian Institute of Information Technology, Design and Manufacturing.