Multibeam has re-innovated e-beam lithography to enable cost-effective production of leading-edge semiconductors for advanced packaging, photonics, rapid prototyping, and other special applications. 

It is the industry’s only maskless multi-column e-beam platform that offers full-wafer direct write patterning capabilities with fine resolution in a modular architecture that is optimized for scale. The fully automated system features multiple miniaturized e-beam delivery columns and advanced algorithms that enable precision patterning with fab-level productivity. 

Innovated by patterning and wafer fab equipment experts, our systems empower IC leaders to make patterns that are impossible, difficult, or too expensive for mask-based solutions, with breakthrough time-to-market advantages.

Semiconductor

Multibeam Corporation

Multibeam Corporation's headquarters in Santa Clara, CA, United States

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Rod Loewen

Andrew Ceballos

Mike Baker

Mike Radtke

Arijit de

David Zhu

Morgan Catha

Justin Fortner

Simon Lui

Ben Hancock

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