SCIL Nanoimprint Solutions
Marc Verschuuren serves as the Director and Chief Technology Officer at SCIL Nanoimprint Solutions since December 2023, focusing on scaling up the nanophotonic production business. Previously, Marc held various positions at Philips from October 2001 to December 2023, including Business Development Manager for SCIL Nanoimprint Solutions, Senior Scientist, and Research Scientist, where significant contributions were made to the development of solutions for high-volume nanoimprinting and advancements in nanophotonics. Notable achievements include leading technology transfer to Suss MicroTec, developing photonic crystals for LEDs, and securing several patents for novel materials. Academic qualifications include a PhD in Nanotechnology/Nanophotonics from Utrecht University and a Bachelor of Applied Science in Chemical Engineering from Fontys University of Applied Sciences. Early career experiences involve internships at Yscor Steel and TNO Science and Industry.
This person is not in any teams
SCIL Nanoimprint Solutions
SCIL Nanoimprint Solutions offers solutions for patterning nano-structures on large wafers by using its unique and proprietary lithography technology (SCIL). SCIL or Substrate Conformal Imprint Lithography is a cost effective, robust, high yield process enabling nanometer resolution patterns on a large variety of materials. SCIL delivers proven, high quality imprints on wafer areas up to 300 mm. It can be used to make patterns with feature sizes down to less than 10 nm and overlay alignment down to 1 µm. We help customers with optimized equipment, consumable materials and processes for high volume production. Our solutions enable manufacturers of optics and photonic products to increase performance, lower end-product costs and increase functionality.