ARCNL
Roland Bliem is a Group Leader at ARCNL since February 2019, overseeing the Materials and Surface Science group, which investigates fundamental physical and chemical processes at surfaces relevant to nanolithography and the development of new materials for EUV lithography. Concurrently, Roland serves as an Assistant Professor at the University of Amsterdam's Institute of Physics. Previous experience includes a Postdoctoral Researcher role at the Massachusetts Institute of Technology, focusing on the electrochemical stability of perovskite surfaces, and another Postdoctoral position at Technische Universität Wien, which continued PhD research on single-atom catalysis. Roland holds a Dr. techn. in Experimental Surface Physics and a Master’s in Physics from Technische Universität Wien, complemented by early internships in computational materials science and development roles in the wheel loader industry.
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ARCNL
At the Advanced Research Center for Nanolithography (ARCNL) we do exciting fundamental physics at the highest possible level with a relevance to key technologies in nanolithography. We wish to contribute to the production of ever smarter and smaller electronics, while at the same time pushing the boundaries of our fundamental insight into the workings of nature. About ARCNL ARCNL started in January 2014 and opened its lab doors in October of the same year. ARCNL’s start was within one year after ASML had issued a tender for proposals for a research center that would feed the company with new, fundamental knowledge. ASML is the world leader in the production of the lithography machines that define the structures of processor and memory chips for computers, tablets and smartphones. In order to remain at the forefront it constantly innovates its products and processes. Novel insights from research by excellent academics in the relevant fields will enable them to continue making big leaps.